Auto Aligner

Brand: Japan Science Engineering Co.,Ltd.

MA4200 exposure system is an all function in one facility printing patterns on photoresist-coated substrates aligned with a mask. MA4200 provides a fully automatic and high-speedy system on substrate loading, alignment, exposure and unloading to increase production efficiency which is ideal for LED, wafer Mems Industries.

Auto Aligner

Features

  • High-speedy, high-accurate exposure performance
  • Low operation cost, High productivity
  • Auto alignment on wafers
  • High efficient dual arm robot handling system

Major Applications

  • LED exposure process
  • Wafer MEMS exposure process

Specifications

Substral SizeSapphire, GaN Φ2"- Φ4"
Mask Size5”×5”
Light source Super-high pressure 500W lamp × 1
Intensity uniformity<±5%